发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
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申请号： US12836543申请日： 2010-07-14
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公开(公告)号： US20100270709A1公开(公告)日： 2010-10-28
- 发明人: Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
- 申请人： Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03254812.5 20030731
- 主分类号： B29C35/08
- IPC分类号： B29C35/08 ; B29C35/02
摘要：
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
公开/授权文献
- US08142852B2 Lithographic apparatus and device manufacturing method 公开/授权日：2012-03-27