发明申请
US20100273967A1 FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS
审中-公开
氟化聚合物,负离子敏感性树脂组合物和分散剂
- 专利标题: FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS
- 专利标题(中): 氟化聚合物,负离子敏感性树脂组合物和分散剂
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申请号: US12828820申请日: 2010-07-01
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公开(公告)号: US20100273967A1公开(公告)日: 2010-10-28
- 发明人: Hideyuki TAKAHASHI , Kenji Ishizeki
- 申请人: Hideyuki TAKAHASHI , Kenji Ishizeki
- 申请人地址: JP Chiyoda-ku
- 专利权人: Asahi Glass Company, Limited
- 当前专利权人: Asahi Glass Company, Limited
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2005-361910 20051215
- 主分类号: C08F220/22
- IPC分类号: C08F220/22 ; C08F16/24
摘要:
To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition.A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.
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