发明申请
US20100278766A1 NITROCELLULOSE-FREE NAIL POLISH COMPOSITIONS 有权
无溶剂的NAIL POLISH组合物

NITROCELLULOSE-FREE NAIL POLISH COMPOSITIONS
摘要:
The present invention relates to a nail polish composition, comprising at least one high gloss film forming agent chosen from an esterified styrene maleic anhydride copolymer, a non-esterified styrene maleic anhydride copolymer and mixtures thereof, at least one co-film forming agent chosen from an epoxy resin, optionally, at least one plasticizer, at least one solvent, and optionally, at least one colorant, wherein the composition does not require use of nitrocellulose and can be used to makeup or protect nails. Such compositions impart high gloss, good adhesion and long wear properties.
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