发明申请
- 专利标题： METHOD FOR MAKING A PHOTORESIST STRIPPING SOLUTION COMPRISING AN ORGANIC SULFONIC ACID AND AN ORGANIC HYDROCARBON SOLVENT
- 专利标题（中）： 制造包含有机硫酸和有机碳氢化合物的光催化剂剥离溶液的方法
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申请号： US12564584申请日： 2009-09-22
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公开(公告)号： US20100279910A1公开(公告)日： 2010-11-04
- 发明人: Wai Mun Lee
- 申请人： Wai Mun Lee
- 主分类号： G03F7/42
- IPC分类号： G03F7/42 ; C11D3/34
摘要：
An improved method for making a photoresist stripping solution for a metal-containing semi-conductor substrate where the stripping solution comprises a blend of at least one organic sulfonic acid with a halogen-free hydrocarbon solvent wherein concentrations of trace amounts of residual sulfuric acid and sulfur trioxide in the blend are reduced to very low levels.
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