发明申请
- 专利标题: Linear Deposition Source
- 专利标题(中): 线性沉积源
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申请号: US12818101申请日: 2010-06-17
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公开(公告)号: US20100282167A1公开(公告)日: 2010-11-11
- 发明人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
- 申请人: Chad Conroy , Scott Wayne Priddy , Jacob A. Dahlstrom , Rich Bresnahan , David William Gotthold , John Patrin
- 申请人地址: US NY Plainview
- 专利权人: VEECO INSTRUMENTS INC.
- 当前专利权人: VEECO INSTRUMENTS INC.
- 当前专利权人地址: US NY Plainview
- 主分类号: C23C16/448
- IPC分类号: C23C16/448 ; C23C16/44
摘要:
A deposition source includes a crucible for containing deposition material and a body comprising a conductance channel. An input of the conductance channel is coupled to an output of the crucible. A heater heats the crucible so that the crucible evaporates the deposition material into the conductance channel. A heat shield comprising a plurality of heat resistant material layers is positioned around at least one of the heater and the body. A plurality of nozzles is coupled to an output of the conductance channel so that evaporated deposition material is transported from the crucible through the conductance channel to the plurality of nozzles where the evaporated deposition material is ejected from the plurality of nozzles to form a deposition flux.
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