发明申请
US20100283032A1 METHOD FOR FORMING A SEMIDCONDUCTOR STRUCTURE 有权
形成半导体结构的方法

METHOD FOR FORMING A SEMIDCONDUCTOR STRUCTURE
摘要:
Method for Forming a Semiconductor Structure A method and apparatus for applying a carrier fluid (101,602,1101) to a substrate (102), the carrier fluid carrying nanoparticles (201,202), manipulating the positions of a plurality of the nanoparticles (201,202) in the carrier fluid by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on the substrate, and sintering the nanoparticles to form a region.
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