发明申请
- 专利标题: METHOD FOR FORMING A SEMIDCONDUCTOR STRUCTURE
- 专利标题(中): 形成半导体结构的方法
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申请号: US12598368申请日: 2008-03-31
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公开(公告)号: US20100283032A1公开(公告)日: 2010-11-11
- 发明人: Petri Korpi , Risto Ronkka
- 申请人: Petri Korpi , Risto Ronkka
- 申请人地址: FI Espoo
- 专利权人: NOKIA CORPORATION
- 当前专利权人: NOKIA CORPORATION
- 当前专利权人地址: FI Espoo
- 优先权: GB0708381.9 20070430
- 国际申请: PCT/EP08/53781 WO 20080331
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; B05D1/04 ; B05C11/00
摘要:
Method for Forming a Semiconductor Structure A method and apparatus for applying a carrier fluid (101,602,1101) to a substrate (102), the carrier fluid carrying nanoparticles (201,202), manipulating the positions of a plurality of the nanoparticles (201,202) in the carrier fluid by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on the substrate, and sintering the nanoparticles to form a region.
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