Invention Application
US20100291294A1 Method of fabricating magnetic head slider including partial removal step of protecting film
有权
制造磁头滑块的方法，包括保护薄膜的部分去除步骤
- Patent Title: Method of fabricating magnetic head slider including partial removal step of protecting film
- Patent Title (中): 制造磁头滑块的方法，包括保护薄膜的部分去除步骤
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Application No.: US12588911Application Date: 2009-11-02
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Publication No.: US20100291294A1Publication Date: 2010-11-18
- Inventor: Kunihiro Ueda , Hong Xin Fang , Dong Wong
- Applicant: Kunihiro Ueda , Hong Xin Fang , Dong Wong
- Applicant Address: CN Hong Kong
- Assignee: SAE Magnetics (H.K.) Ltd.
- Current Assignee: SAE Magnetics (H.K.) Ltd.
- Current Assignee Address: CN Hong Kong
- Priority: CN200910145687.7 20090515; JP2009-164430 20090713
- Main IPC: G11B5/40
- IPC: G11B5/40 ; G11B5/127
Abstract:
The method of fabricating a magnetic head slider includes steps of: forming a first protective film on an air bearing surface of a magnetic head slider on which either a recording element or a reproduction element is formed or on which both a recording element and a reproduction element are formed; removing a portion of the first protective film to reduce the thickness of the first protective film and forming a second protective film over the first protective film that has been reduced in thickness; and forming an uneven portion for controlling the flying characteristics of the magnetic head slider on the air bearing surface of the magnetic head slider; wherein the formation of the uneven portion is carried out after the first protective film has been formed and before the second protective film is formed, or after the second protective film has been formed.
Public/Granted literature
- US08420159B2 Method of fabricating magnetic head slider including partial removal step of protecting film Public/Granted day:2013-04-16
Information query
IPC分类:
