Invention Application
US20100291489A1 EXPOSURE METHODS FOR FORMING PATTERNED LAYERS AND APPARATUS FOR PERFORMING THE SAME
审中-公开
用于形成图案的曝光方法和用于实施其的装置
- Patent Title: EXPOSURE METHODS FOR FORMING PATTERNED LAYERS AND APPARATUS FOR PERFORMING THE SAME
- Patent Title (中): 用于形成图案的曝光方法和用于实施其的装置
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Application No.: US12466853Application Date: 2009-05-15
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Publication No.: US20100291489A1Publication Date: 2010-11-18
- Inventor: Martin Moskovits , Linh Nguyen , Robert Koefer , Qihong Wu , Xu Zhang , Shiaw-Wen Tai
- Applicant: Martin Moskovits , Linh Nguyen , Robert Koefer , Qihong Wu , Xu Zhang , Shiaw-Wen Tai
- Applicant Address: US NJ Somerset
- Assignee: API Nanofabrication and Research Corp.
- Current Assignee: API Nanofabrication and Research Corp.
- Current Assignee Address: US NJ Somerset
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at λ through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
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