发明申请
- 专利标题: ELECTROMAGNETIC BANDGAP PATTERN STRUCTURE, METHOD OF MANUFACTURING THE SAME, AND SECURITY PRODUCT USING THE SAME
- 专利标题(中): 电磁带式图案结构及其制造方法及使用其的安全产品
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申请号: US12784356申请日: 2010-05-20
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公开(公告)号: US20100295633A1公开(公告)日: 2010-11-25
- 发明人: Jong Won YU , Won Gyu Lim , Hyeong Seok Jang , Dong Hoon Shin , Jin Ho Ryu , Hyun Mi Kim , Won Gyun Choe
- 申请人: Jong Won YU , Won Gyu Lim , Hyeong Seok Jang , Dong Hoon Shin , Jin Ho Ryu , Hyun Mi Kim , Won Gyun Choe
- 优先权: KR10-2009-0045159 20090522
- 主分类号: H01P1/203
- IPC分类号: H01P1/203 ; G03F7/20 ; B05D5/00
摘要:
Disclosed herein is an electromagnetic bandgap (EBG) pattern structure, including: a nonconductive substrate; and a pattern assembly formed on the substrate and including regularly arranged closed-loop patterns and open-loop patterns both of which are made of a conductive material. The EBG pattern structure is advantageous in that it can be used to manufacture new security products by applying its frequency characteristics to securities or IDs and in that it can be variously used in security technologies for preventing forgery and alteration because various security codes can be created by adjusting the variables of its EBG pattern.