发明申请
US20100297555A1 MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
有权
具有电子取代取代基和LACTONE SKELETON,聚合物和光催化剂组合物的单体
- 专利标题: MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
- 专利标题(中): 具有电子取代取代基和LACTONE SKELETON,聚合物和光催化剂组合物的单体
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申请号: US12863924申请日: 2009-02-03
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公开(公告)号: US20100297555A1公开(公告)日: 2010-11-25
- 发明人: Hiroshi Koyama , Kyuhei Kitao , Akira Eguchi
- 申请人: Hiroshi Koyama , Kyuhei Kitao , Akira Eguchi
- 优先权: JP2008-0435012008 20080225
- 国际申请: PCT/JP2009/000402 WO 20090203
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; C07D307/77 ; C08F24/00 ; G03F7/004
摘要:
Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein Ra represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms.The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.
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