发明申请
- 专利标题： Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent
- 专利标题（中）： 新型磺酸盐及其衍生物，光酸发生剂和抗光材料和图案形成方法使用光酸发生剂
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申请号： US12740780申请日： 2008-10-31
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公开(公告)号： US20100304303A1公开(公告)日： 2010-12-02
- 发明人: Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
- 申请人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
- 申请人地址： JP Ube-shi, Yamaguchi
- 专利权人： Central Glass Company, Limited
- 当前专利权人： Central Glass Company, Limited
- 当前专利权人地址： JP Ube-shi, Yamaguchi
- 优先权： JP2007-285566 20071101
- 国际申请： PCT/JP2008/069928 WO 20081031
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07C271/24 ; G03F7/20
摘要：
Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.