发明申请
- 专利标题: Roll-to-Roll Chemical Vapor Deposition System
- 专利标题(中): 卷对卷化学气相沉积系统
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申请号: US12479824申请日: 2009-06-07
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公开(公告)号: US20100310766A1公开(公告)日: 2010-12-09
- 发明人: Eric A. Armour , William E. Quinn , Piero Sferlazzo
- 申请人: Eric A. Armour , William E. Quinn , Piero Sferlazzo
- 申请人地址: US NJ Somerset
- 专利权人: VEECO COMPOUND SEMICONDUCTOR, INC.
- 当前专利权人: VEECO COMPOUND SEMICONDUCTOR, INC.
- 当前专利权人地址: US NJ Somerset
- 主分类号: C23C16/458
- IPC分类号: C23C16/458 ; C23C16/44
摘要:
A roll-to-roll CVD system includes at least two rollers that transport a web through a deposition chamber during CVD processing. The deposition chamber defines a passage for the web to pass through while being transported by the at least two rollers. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources is coupled to the gas input port of each of the plurality of process chambers.
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