发明申请
- 专利标题: METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE
- 专利标题(中): 制造光电转换器件的方法
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申请号: US12792844申请日: 2010-06-03
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公开(公告)号: US20100330723A1公开(公告)日: 2010-12-30
- 发明人: Takehito Okabe , Hiroaki Naruse , Ryuichi Mishima , Kouhei Hashimoto
- 申请人: Takehito Okabe , Hiroaki Naruse , Ryuichi Mishima , Kouhei Hashimoto
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-152873 20090626; JP2009-152875 20090626; JP2010-115746 20100519
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
In a method of manufacturing a photoelectric conversion device having a pixel region and a peripheral circuit region, a semiconductor compound layer is formed by causing a surface of a diffusion layer or gate electrode of a MOS transistor in the peripheral circuit region to react with a high melting point metal, then an insulating layer is formed in the pixel region and the peripheral circuit region after the step of forming a semiconductor compound layer. A contact hole is formed in the insulating layer to expose a diffusion layer in the pixel region, and a contact hole is formed in the insulating layer to expose the semiconductor compound layer formed in the peripheral circuit region. These holes are formed at different timings. Prior to forming the hole which is formed later, a contact plug is formed in the contact hole which is formed earlier.
公开/授权文献
- US07993951B2 Method of manufacturing photoelectric conversion device 公开/授权日:2011-08-09
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