发明申请
- 专利标题: POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE
- 专利标题(中): 用于抛光硬质基材的抛光油浆
-
申请号: US12886810申请日: 2010-09-21
-
公开(公告)号: US20110005143A1公开(公告)日: 2011-01-13
- 发明人: Kenji Aoki , Toru Yamazaki , Takehiro Watanabe , Naoyuki Hamada
- 申请人: Kenji Aoki , Toru Yamazaki , Takehiro Watanabe , Naoyuki Hamada
- 申请人地址: JP Tokyo
- 专利权人: NIHON MICRO COATING CO., LTD.
- 当前专利权人: NIHON MICRO COATING CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-326334 20061201
- 主分类号: C09K3/14
- IPC分类号: C09K3/14 ; C09G1/02
摘要:
A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.