发明申请
- 专利标题： Low Activation Energy Photoresist Composition and Process for Its Use
- 专利标题（中）： 低激活能量光刻胶组合物及其使用方法
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申请号： US12253072申请日： 2008-10-16
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公开(公告)号： US20110008727A1公开(公告)日： 2011-01-13
- 发明人: Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Hoa D. Truong
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08F32/08 ; C08F24/00 ; G03F7/004
摘要：
The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.