发明申请
- 专利标题： METHOD OF CLEANING SUPPORT PLATE
- 专利标题（中）： 清洁支撑板的方法
-
申请号： US12837790申请日： 2010-07-16
-
公开(公告)号： US20110017231A1公开(公告)日： 2011-01-27
- 发明人: Tatsuhiro MITAKE , Miyanari Atsushi , Inao Yoshihiro
- 申请人： Tatsuhiro MITAKE , Miyanari Atsushi , Inao Yoshihiro
- 优先权： JP2009-170012 20090721
- 主分类号： B08B7/00
- IPC分类号： B08B7/00
摘要：
The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.
公开/授权文献
- US08097087B2 Method of cleaning support plate 公开/授权日：2012-01-17
信息查询
