Invention Application
- Patent Title: PLASMA GENERATING APPARATUS
- Patent Title (中): 等离子体发生装置
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Application No.: US12607174Application Date: 2009-10-28
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Publication No.: US20110018443A1Publication Date: 2011-01-27
- Inventor: Chwung-Shan KOU , Yan-Ru Pan , Shin-Hua Lin , Teng-Wei Wang , Yi-Hsiang Chan , Jui-Yu Lin
- Applicant: Chwung-Shan KOU , Yan-Ru Pan , Shin-Hua Lin , Teng-Wei Wang , Yi-Hsiang Chan , Jui-Yu Lin
- Priority: TW098124529 20090721
- Main IPC: H05H1/24
- IPC: H05H1/24

Abstract:
A plasma generating apparatus includes a chamber, a slow wave antenna and an electromagnetic wave generator. The chamber has an accommodating space. The slow wave antenna has a central conductive tube passing through the accommodating space, and a dielectric tube arranged around the central tube. The electromagnetic wave generator is used for coupling electromagnetic wave into the slow wave antenna. An electromagnetic wave transmitted by the electromagnetic wave generator can pass through the slow wave antenna and radiate into the accommodating space.
Information query
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