发明申请
- 专利标题： OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH AN OPTICAL ELEMENT, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY
- 专利标题（中）： 光学元件，包括这种光学元件的光刻设备，器件制造方法及其制造的器件
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申请号： US12919741申请日： 2009-02-24
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公开(公告)号： US20110019174A1公开(公告)日： 2011-01-27
- 发明人: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
- 申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
- 优先权： US61064313 20080227; US61/129689 20080711
- 国际申请： PCT/EP09/01299 WO 20090224
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02B5/22 ; G02B5/26 ; G03B27/72
摘要：
An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.