Invention Application
- Patent Title: FABRICATION METHOD FOR FUNCTIONAL SURFACE
- Patent Title (中): 功能表面的制造方法
-
Application No.: US12845233Application Date: 2010-07-28
-
Publication No.: US20110028305A1Publication Date: 2011-02-03
- Inventor: Hyuneui LIM , Seungmuk JI , Jun-Hee LEE , Wan-Doo KIM
- Applicant: Hyuneui LIM , Seungmuk JI , Jun-Hee LEE , Wan-Doo KIM
- Applicant Address: KR Daejeon
- Assignee: KOREA INSTITUTE OF MACHINERY AND MATERIALS
- Current Assignee: KOREA INSTITUTE OF MACHINERY AND MATERIALS
- Current Assignee Address: KR Daejeon
- Priority: KR10-2009-0069292 20090729
- Main IPC: B01J35/10
- IPC: B01J35/10

Abstract:
Provided is a fabrication method for a functional surface that has self-cleaning ability and superhydrophilic anti-reflective property, which includes a) arranging a plurality of beads having a sphere shape on a surface of a transparent substrate; b) forming a predetermined inter-bead gap by etching the plurality of beads; c) forming a surface unevenness on the surface of the substrate by etching the substrate using the plurality of the beads having the predetermined gap as an etching mask; d) removing the plurality of the beads from the surface of the substrate; and e) forming a photocatalytic layer or a compound layer having a surface tension of 18 to 28 N/m on the surface of the substrate formed with the surface unevenness.
Public/Granted literature
- US08728571B2 Fabrication method for functional surface Public/Granted day:2014-05-20
Information query