发明申请
US20110031460A1 Self-Aligned Memory Cells and Method for Forming 有权
自对准记忆单元和形成方法

  • 专利标题: Self-Aligned Memory Cells and Method for Forming
  • 专利标题(中): 自对准记忆单元和形成方法
  • 申请号: US12908406
    申请日: 2010-10-20
  • 公开(公告)号: US20110031460A1
    公开(公告)日: 2011-02-10
  • 发明人: Charles H. Dennison
  • 申请人: Charles H. Dennison
  • 主分类号: H01L45/00
  • IPC分类号: H01L45/00
Self-Aligned Memory Cells and Method for Forming
摘要:
The invention provides a memory cell based on variable resistance material memory element that includes an access device having a pillar structure that may also include a protective sidewall layer. The pillar access device selects and isolates the memory cell from other memory array cells and is adapted to both self-align any memory element formed thereon, and to deliver suitable programming current to the memory element. The pillar structure is formed from one or more access device layers stacked above a wordline and below the memory element. Optional resistive layers may be selectively formed within the pillar structure to minimize resistance in the access device layer and the memory element. The pillar access device may be a diode, transistor, Ovonic threshold switch or other device capable of regulating current flow to an overlying programmable memory material.
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