发明申请
- 专利标题: TRANSFERRING MEDIUM MANUFACTURING METHOD AND TRANSFERRING MEDIUM
- 专利标题(中): 传输介质制造方法和传输介质
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申请号: US12852874申请日: 2010-08-09
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公开(公告)号: US20110033697A1公开(公告)日: 2011-02-10
- 发明人: Kunihiko MATSUHASHI
- 申请人: Kunihiko MATSUHASHI
- 申请人地址: JP Tokyo
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-185928 20090810
- 主分类号: B32B7/12
- IPC分类号: B32B7/12 ; C09J5/00
摘要:
A transferring medium manufacturing method uses a base material, a recording material, and a non-recording material and causes the recording material to adhere to the base material. The transferring medium manufacturing method includes a recording material applying operation in which the recording material is applied to the base material. In a first non-recording material applying operation, the non-recording material is applied to a peripheral part of a recording material applied area. The peripheral part is located along an edge of the recording material applied area. The recording material applied area is an area of the base material where the recording material is applied. In a second non-recording material applying operation, the non-recording material is applied to an inner area, which is surrounded by, and/or located at a relatively inner area position in comparison with an area position of, the peripheral part of the recording material applied area.
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