发明申请
- 专利标题: Semiconductor on Insulator
- 专利标题(中): 半导体绝缘子
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申请号: US12911649申请日: 2010-10-25
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公开(公告)号: US20110039377A1公开(公告)日: 2011-02-17
- 发明人: Been-Yih Jin , Reza Arghavani , Robert Chau
- 申请人: Been-Yih Jin , Reza Arghavani , Robert Chau
- 主分类号: H01L21/84
- IPC分类号: H01L21/84
摘要:
A method and apparatus for producing a relatively thin, relatively uniform semiconductor layer which has improved carrier mobility. In an embodiment, a lattice-matched insulator layer is formed on a semiconductor substrate, and a lattice-matched semiconductor layer is formed on the insulator layer to form a relatively thin, relatively uniform semiconductor on insulator apparatus. In embodiments of the method and apparatus, energy band characteristics may be used to facilitate the extraction of the well-region minority carriers.
公开/授权文献
- US08173495B2 Semiconductor on insulator 公开/授权日:2012-05-08
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