发明申请
- 专利标题： GAS DISTRIBUTION RING ASSEMBLY FOR PLASMA SPRAY SYSTEM
- 专利标题（中）： 用于等离子体喷雾系统的气体分配环组件
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申请号： US12546226申请日： 2009-08-24
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公开(公告)号： US20110042358A1公开(公告)日： 2011-02-24
- 发明人: Joseph Garfield Albanese , Donald Joseph Baldwin , Yuk-chiu Lau , Christopher Joseph Lochner , William Patrick Rusch
- 申请人： Joseph Garfield Albanese , Donald Joseph Baldwin , Yuk-chiu Lau , Christopher Joseph Lochner , William Patrick Rusch
- 申请人地址： US NY Schenectady
- 专利权人： GENERAL ELECTRIC COMPANY
- 当前专利权人： GENERAL ELECTRIC COMPANY
- 当前专利权人地址： US NY Schenectady
- 主分类号： H05H1/34
- IPC分类号： H05H1/34
摘要：
A gas distribution ring assembly for a plasma spray system includes a gas distribution ring including a plurality of openings allowing a gas to pass to an inner diameter thereof. The assembly also includes a separate positioning ring axially aligned with the gas distribution ring between the gas distribution ring and an electrically charged outlet of the plasma spray system.
公开/授权文献
- US08350181B2 Gas distribution ring assembly for plasma spray system 公开/授权日：2013-01-08
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