Invention Application
US20110051387A1 METHOD FOR ELECTROLESS NICKEL-PALLADIUM-GOLD PLATING, PLATED PRODUCT, PRINTED WIRING BOARD, INTERPOSER AND SEMICONDUCTOR APPARATUS
审中-公开
电镀镍 - 镀金镀层,印制产品,印刷线路板,插销器和半导体装置的方法
- Patent Title: METHOD FOR ELECTROLESS NICKEL-PALLADIUM-GOLD PLATING, PLATED PRODUCT, PRINTED WIRING BOARD, INTERPOSER AND SEMICONDUCTOR APPARATUS
- Patent Title (中): 电镀镍 - 镀金镀层,印制产品,印刷线路板,插销器和半导体装置的方法
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Application No.: US12852522Application Date: 2010-08-09
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Publication No.: US20110051387A1Publication Date: 2011-03-03
- Inventor: Kenya TACHIBANA , Teppei ITO , Yasuaki MITSUI
- Applicant: Kenya TACHIBANA , Teppei ITO , Yasuaki MITSUI
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO BAKELITE COMPANY, LTD.
- Current Assignee: SUMITOMO BAKELITE COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2009-185622 20090810
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K7/00 ; H05H1/00

Abstract:
An object of the present invention is to provide an electroless nickel-palladium-gold plating method which is able, when performed on a plating target surface such as terminals of a printed wiring board, terminals of other electronic components, and other resin substrates with a fine metal pattern, to prevent abnormal metal deposition on a resin surface which is an undercoat and to provide a high-quality plated surface. Another object of the present invention is to provide a plated product with a high-quality plated surface, particularly such as an interposer and motherboard, and a semiconductor apparatus using the same. These objects were achieved by the electroless nickel-palladium-gold plating method of the present invention, which is a method for plating target objects such as terminals of a printed wiring board and in which at least one surface treatment selected from a treatment with a solution of pH 10 to 14 and a plasma treatment is performed at an optional step after the step of providing a palladium catalyst and before the step of performing electroless palladium plating.
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