Invention Application
- Patent Title: Positive Typed Photosensitive Composition
- Patent Title (中): 正面类型的感光构图
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Application No.: US12649500Application Date: 2009-12-30
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Publication No.: US20110053080A1Publication Date: 2011-03-03
- Inventor: Joo Hyeon Park , Jung Hwan Cho , Jin Han Lee , Kyung Chul Son
- Applicant: Joo Hyeon Park , Jung Hwan Cho , Jin Han Lee , Kyung Chul Son
- Applicant Address: KR Seoul
- Assignee: KOREA KUMHO PETROCHEMICAL CO., LTD
- Current Assignee: KOREA KUMHO PETROCHEMICAL CO., LTD
- Current Assignee Address: KR Seoul
- Priority: KR1020090081182 20090831
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08G69/26

Abstract:
Disclosed is a positive typed photosensitive composition including a polyamide derivative represented by the following Chemical Formula, and a heat-acid generator. where R1, R2, R4, and R5 independently represent a bivalent to hexavalent aryl group with at least two carbon atoms, R3 represents either a hydrogen atom or an alkyl group with 1 to 10 carbon atoms, k represents an integer of 10 to 1,000, 1 represents an integer of 1 to 1,000, n and m independently represent an integer of 0 to 2 (n+m>0), and X represents either a hydrogen atom or an aryl group with 2 to 30 carbon atoms.
Information query
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