发明申请
- 专利标题: ELECTROWETTING PIXEL STRUCTURE
- 专利标题(中): 电镀像素结构
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申请号: US12875769申请日: 2010-09-03
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公开(公告)号: US20110058245A1公开(公告)日: 2011-03-10
- 发明人: Shih-Yuan WANG , Hsi-Rong Han , Chien-Ting Chan , Wan-Jen Tsai , Wei-Yuan Cheng , Kuo-Lung Lo
- 申请人: Shih-Yuan WANG , Hsi-Rong Han , Chien-Ting Chan , Wan-Jen Tsai , Wei-Yuan Cheng , Kuo-Lung Lo
- 优先权: TW098129794 20090904; TW099124849 20100728
- 主分类号: G02B26/00
- IPC分类号: G02B26/00
摘要:
An electrowetting pixel structure includes a substrate, a hydrophobic dielectric layer, a non-polar liquid, a polar liquid, at least one electrode, and at least one contact hole. The hydrophobic dielectric layer is formed on the substrate, the non-polar liquid covers one surface of the hydrophobic dielectric layer, and the polar liquid is provided on the hydrophobic dielectric layer where the non-polar liquid and the polar liquid are immiscible. The electrode is formed on the substrate and divides the substrate into an electrode section and a non-electrode section. When a voltage is applied to the electrowetting pixel structure, the non-polar liquid contracts on the hydrophobic dielectric layer and is confined to an area substantially overlapping the non-electrode section. The contact hole is formed on the substrate at a position away from the non-electrode section of the electrowetting pixel structure.
公开/授权文献
- US08213090B2 Electrowetting pixel structure 公开/授权日:2012-07-03
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