Invention Application
US20110058991A1 GASIFICATION DEVICE WITH SLAG REMOVAL FACILITY 审中-公开
具有排渣装置的气化装置

  • Patent Title: GASIFICATION DEVICE WITH SLAG REMOVAL FACILITY
  • Patent Title (中): 具有排渣装置的气化装置
  • Application No.: US12735963
    Application Date: 2009-02-13
  • Publication No.: US20110058991A1
    Publication Date: 2011-03-10
  • Inventor: Eberhard KuskeChristoph Hanrott
  • Applicant: Eberhard KuskeChristoph Hanrott
  • Applicant Address: DE Dortmund
  • Assignee: UHDE GMBH
  • Current Assignee: UHDE GMBH
  • Current Assignee Address: DE Dortmund
  • Priority: DE102008012732.9 20080305
  • International Application: PCT/EP2009/001004 WO 20090213
  • Main IPC: B01J8/00
  • IPC: B01J8/00
GASIFICATION DEVICE WITH SLAG REMOVAL FACILITY
Abstract:
A device for the gasification of liquid or fine-grain solid fuel materials in an entrained bed reactor, at temperatures above the ash melting point and at a pressure of 0.3 to 8 MPa, including a gasification reactor and a water bath being arranged in a pressure vessel. The water bath being installed below the gasification reactor and the a/m gasification reactor being designed in such a manner that the synthesis gas produced is withdrawn in the upper section of the reactor, the liquid slag precipitating on the walls of the reactor chamber and then having a free downflow, without any solidification of the surface of the said slag. The lower side of the reaction chamber has an outlet opening with a drop-off edge so that the downstream of liquid slag can freely fall from the drop-off edge. A slag removal duct is arranged below the opening and reaches down into the water bath, the upper wall section of the slag removal duct is penetrated by a cooling agent and the internal side of the duct is completely lined with a temperature-resistant insulating compound. The lower section of the slag removal duct which reaches down into the water bath is wetted by a water film on the internal side, the upper and lower sections being connected with each other in such a manner that the water film of the upper wall section does not come into contact with the wall section penetrated by a cooling agent nor with the insulating compound.
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