发明申请
US20110062641A1 STAGE EQUIPPED WITH ALIGNMENT FUNCTION, PROCESSING APPARATUS HAVING THE STAGE EQUIPPED WITH ALIGNMENT FUNCTION, AND METHOD OF ALIGNING SUBSTRATE
审中-公开
具有对准功能的装置,具有对准功能的装置的处理装置,以及对准基板的方法
- 专利标题: STAGE EQUIPPED WITH ALIGNMENT FUNCTION, PROCESSING APPARATUS HAVING THE STAGE EQUIPPED WITH ALIGNMENT FUNCTION, AND METHOD OF ALIGNING SUBSTRATE
- 专利标题(中): 具有对准功能的装置,具有对准功能的装置的处理装置,以及对准基板的方法
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申请号: US12991993申请日: 2009-06-03
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公开(公告)号: US20110062641A1公开(公告)日: 2011-03-17
- 发明人: Seiichi Sato , Mitsuru Yahagi , Hirofumi Minami , Kazuhiro Musha , Makoto Takahashi
- 申请人: Seiichi Sato , Mitsuru Yahagi , Hirofumi Minami , Kazuhiro Musha , Makoto Takahashi
- 优先权: JP2008-145585 20080603; JP2008-241474 20080919
- 国际申请: PCT/JP2009/060118 WO 20090603
- 主分类号: B25B11/00
- IPC分类号: B25B11/00
摘要:
There is provided an inexpensive stage which is equipped with an alignment function and is capable of easily performing high-accuracy alignment especially in a θ direction even in case an object to be processed is large in weight. The stage equipped with an alignment function has a stage main body for holding a substrate while leaving a processing surface thereof open to access. The stage is provided with: a suction means capable of sucking that surface of the substrate which lies opposite to the processing surface; a gas supply means for supplying a gas to such a region of the substrate as is other than a portion sucked by the suction means; and a drive means to give a rotating force to the suction means so that the substrate can be rotated on the same plane by causing the suction means to serve as the center of rotation.
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