发明申请
- 专利标题: APPARATUS AND METHOD FOR INSPECTING DEFECTS
- 专利标题(中): 检查缺陷的装置和方法
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申请号: US12950243申请日: 2010-11-19
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公开(公告)号: US20110063603A1公开(公告)日: 2011-03-17
- 发明人: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
- 申请人: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
- 优先权: JP2006-013285 20060123
- 主分类号: G01N21/88
- IPC分类号: G01N21/88 ; G01J4/00
摘要:
A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
公开/授权文献
- US07973920B2 Apparatus and method for inspecting defects 公开/授权日:2011-07-05
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