发明申请
US20110064949A1 ELECTROSPUN NANO FABRIC FOR IMPROVING IMPACT RESISTANCE AND INTERLAMINAR STRENGTH
审中-公开
ELECTROSPUN NANO织物用于提高抗冲击强度和层间强度
- 专利标题: ELECTROSPUN NANO FABRIC FOR IMPROVING IMPACT RESISTANCE AND INTERLAMINAR STRENGTH
- 专利标题(中): ELECTROSPUN NANO织物用于提高抗冲击强度和层间强度
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申请号: US12815043申请日: 2010-06-14
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公开(公告)号: US20110064949A1公开(公告)日: 2011-03-17
- 发明人: Ronnie L. Bolick , Ajit D. Kelkar , Sachin Shendokar
- 申请人: Ronnie L. Bolick , Ajit D. Kelkar , Sachin Shendokar
- 主分类号: B29C47/00
- IPC分类号: B29C47/00 ; B32B27/02
摘要:
The present invention provides a process for forming a composite material having improved interlaminar properties.