发明申请
- 专利标题: Multiple Device Shaping Uniform Distribution of Current Density in Electro-Static Focusing Systems
- 专利标题(中): 多器件形成电静态聚焦系统中电流密度的均匀分布
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申请号: US12957576申请日: 2010-12-01
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公开(公告)号: US20110068675A1公开(公告)日: 2011-03-24
- 发明人: Artush A. Abgaryan , Eli Levi
- 申请人: Artush A. Abgaryan , Eli Levi
- 申请人地址: US NY HAUPPAUGE
- 专利权人: ATTI INTERNATIONAL SERVICES COMPANY, INC.
- 当前专利权人: ATTI INTERNATIONAL SERVICES COMPANY, INC.
- 当前专利权人地址: US NY HAUPPAUGE
- 主分类号: H01J29/46
- IPC分类号: H01J29/46
摘要:
System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. The system parameters may be calculated and created due to the CGMR conceptual method.
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