发明申请
- 专利标题: METHOD FOR MANUFACTURING POLISHING HEAD AND POLISHING APPARATUS
- 专利标题(中): 制造抛光头和抛光装置的方法
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申请号: US12992782申请日: 2009-06-02
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公开(公告)号: US20110070813A1公开(公告)日: 2011-03-24
- 发明人: Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
- 申请人: Hisashi Masumura , Hiromasa Hashimoto , Kouji Morita , Hiromi Kishida , Satoru Arakawa
- 申请人地址: JP Tokyo JP Nagano-shi, Nagano
- 专利权人: SHIN-ETSU HANDOTAI CO., LTD.,FUJIKOSHI MACHINERY CORP.
- 当前专利权人: SHIN-ETSU HANDOTAI CO., LTD.,FUJIKOSHI MACHINERY CORP.
- 当前专利权人地址: JP Tokyo JP Nagano-shi, Nagano
- 优先权: JP2008-164723 20080624
- 国际申请: PCT/JP2009/002450 WO 20090602
- 主分类号: B24B41/00
- IPC分类号: B24B41/00 ; B24D18/00
摘要:
A method for manufacturing a polishing head having an annular rigid ring; a rubber film bonded to the rigid ring with uniform tension; a mid plate joined to the rigid ring, forming a space together with the rubber film and the rigid ring; and a mechanism for changing pressure of the space, the method including performing a tensile test on the rubber film according to JIS K6251 before bonding the rubber film to the rigid ring, and selecting the rubber film having a value of 10 MPa or less of an inclination obtained by a linear approximation of a stress-strain curve within a strain value of 5%; and bonding the selected rubber film having a value of 10 MPa or less of the inclination to the rigid ring to manufacture the polishing head.