发明申请
- 专利标题: Surface Wave Enabled Darkfield Aperture
- 专利标题(中): 表面波使能暗场光圈
-
申请号: US12792059申请日: 2010-06-02
-
公开(公告)号: US20110075254A1公开(公告)日: 2011-03-31
- 发明人: Xiquan Cui , Xin Heng , Changhuei Yang , Axel Scherer , Demetri Psaltis , Guoan Zheng
- 申请人: Xiquan Cui , Xin Heng , Changhuei Yang , Axel Scherer , Demetri Psaltis , Guoan Zheng
- 主分类号: G02B21/10
- IPC分类号: G02B21/10 ; G02B21/14
摘要:
Embodiments of the present invention relate to a surface wave enabled darkfield aperture structure comprising an aperture layer, a aperture in the aperture layer and a plurality of grooves around the aperture. The aperture layer has a first and second surface. The plurality of grooves is in the first surface. A surface wave propagates along at least the first surface. The plurality of grooves is configured to generate a darkfield at the aperture by modifying the surface wave to cancel out direct transmission of a uniform incident light field received by the aperture.
公开/授权文献
- US08189204B2 Surface wave enabled darkfield aperture 公开/授权日:2012-05-29
信息查询