发明申请
US20110076615A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
有权
丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
- 专利标题（中）： 丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
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申请号： US12895300申请日： 2010-09-30
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公开(公告)号： US20110076615A1公开(公告)日： 2011-03-31
- 发明人: Takeshi KAWABATA , Tomotaka Tsuchimura , Takayuki Ito
- 申请人： Takeshi KAWABATA , Tomotaka Tsuchimura , Takayuki Ito
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-227030 20090930; JP2010-030630 20100215
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below, in which W1 represents an optionally substituted alkylene group, W2 represents a bivalent connecting group, W3 represents an optionally substituted organic group having 15 or more carbon atoms, and Z represents a hydroxyl group or a fluoroalkylsulfonamido group having at least one fluorine atom introduced therein as a substituent.