Invention Application
- Patent Title: SIDE GAS INJECTOR FOR PLASMA REACTION CHAMBER
- Patent Title (中): 等离子体反应室侧气体喷射器
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Application No.: US12871109Application Date: 2010-08-30
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Publication No.: US20110079356A1Publication Date: 2011-04-07
- Inventor: Minshik Kim , Sungyong Ko , Hwankook Chae , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Applicant: Minshik Kim , Sungyong Ko , Hwankook Chae , Kunjoo Park , Keehyun Kim , Weonmook Lee
- Priority: KR10-2009-0093796 20091001
- Main IPC: C23F1/08
- IPC: C23F1/08

Abstract:
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.
Public/Granted literature
- US08652296B2 Side gas injector for plasma reaction chamber Public/Granted day:2014-02-18
Information query
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