发明申请
- 专利标题： OPTICAL ELEMENT AND METHOD
- 专利标题（中）： 光学元件和方法
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申请号： US12966552申请日： 2010-12-13
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公开(公告)号： US20110080569A1公开(公告)日： 2011-04-07
- 发明人: Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
- 申请人： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102006045075.2 20060921
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/72
摘要：
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
公开/授权文献
- US08508854B2 Optical element and method 公开/授权日：2013-08-13
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