Invention Application
- Patent Title: Scintillation materials of low oxygen content and process for producing same
- Patent Title (中): 低氧含量的闪烁材料及其制造方法
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Application No.: US12899948Application Date: 2010-10-07
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Publication No.: US20110084234A1Publication Date: 2011-04-14
- Inventor: Johann-Christoph Von Saldern , Christoph Seitz , Lutz Parthier , Jochen Alkemper
- Applicant: Johann-Christoph Von Saldern , Christoph Seitz , Lutz Parthier , Jochen Alkemper
- Main IPC: C09K11/85
- IPC: C09K11/85 ; C01F17/00

Abstract:
The scintillation material has a maximum oxygen content of 2,500 ppm and is a compound of formula LnX3 or LnX3:D, wherein Ln is at least one rare earth element, X is F, Cl, Br, or I; and D is at least one cationic dopant of one or more of the elements Y, Zr, Pd, Hf and Bi and, if present, is present in an amount of 10 ppm to 10,000 ppm. The process of making the scintillation material includes optionally mixing the compound of the formula LnX3 with the at least one cationic dopant, heating the compound or the mixture so obtained to a melting temperature to form a melt, adding one or more carbon halides and then cooling the melt to form a crystal or crystalline structure. The maximum oxygen content of the scintillation material is preferably 1000 ppm.
Public/Granted literature
- US08673179B2 Scintillation materials of low oxygen content and process for producing same Public/Granted day:2014-03-18
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