Invention Application
- Patent Title: SPIN-POLARIZED ELECTRON SOURCE
- Patent Title (中): 旋转极化电子源
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Application No.: US12736270Application Date: 2009-03-24
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Publication No.: US20110089397A1Publication Date: 2011-04-21
- Inventor: Toru Ujihara , Xiuguang Jin , Yoshikazu Takeda , Tsutomu Nakanishi , Naoto Yamamoto , Takashi Saka , Toshihiro Kato
- Applicant: Toru Ujihara , Xiuguang Jin , Yoshikazu Takeda , Tsutomu Nakanishi , Naoto Yamamoto , Takashi Saka , Toshihiro Kato
- Priority: JP2008-079292 20080325
- International Application: PCT/JP2009/001304 WO 20090324
- Main IPC: H01L29/12
- IPC: H01L29/12

Abstract:
To provide implement a spin-polarized electron generating device having high spin polarization and high external quantum efficiency while allowing a certain degree of freedom in selecting materials of a substrate, a buffer layer, and a strained superlattice layer.In a spin-polarized electron generating device having a substrate, a buffer layer, and a strained superlattice layer formed on the buffer layer, an intermediate layer formed of a crystal having a lattice constant greater than that of a crystal used to form the buffer layer intervenes between the substrate and the buffer layer. With this arrangement, tensile strain causes cracks to be formed in the buffer layer in a direction perpendicular to the substrate, whereby the buffer layer has mosaic-like appearance. As a result, glide dislocations in an oblique direction do not propagate to the strained superlattice layer to be grown on the buffer layer, thereby improving crystallinity of the strained superlattice layer. Accordingly, spin polarization of excited electrons and external quantum efficiency of polarized electrons improve.
Public/Granted literature
- US08344354B2 Spin-polarized electron source Public/Granted day:2013-01-01
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