Invention Application
- Patent Title: Method and apparatus for controlling multiple exposures
- Patent Title (中): 用于控制多次曝光的方法和装置
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Application No.: US12662438Application Date: 2010-04-16
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Publication No.: US20110090365A1Publication Date: 2011-04-21
- Inventor: Joon Hyuk Cha , Young Su Moon , Shi Hwa Lee
- Applicant: Joon Hyuk Cha , Young Su Moon , Shi Hwa Lee
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2009-0100156 20091021
- Main IPC: H04N5/235
- IPC: H04N5/235

Abstract:
Provided is a multi-exposure controlling method and apparatus. An exposure control unit may set an initial exposure time based on a comparison result between a predetermined brightness confidence interval and an average high brightness that is calculated based on at least one current histogram. A comparison unit may compare the brightness confidence interval and an average low brightness that is calculated based on a subsequent histogram obtained by photographing a subject using the set initial exposure time. The exposure control unit may change the initial exposure time based on a comparison result of the comparison unit.
Public/Granted literature
- US08305487B2 Method and apparatus for controlling multiple exposures Public/Granted day:2012-11-06
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