发明申请
- 专利标题: FIELD EMISSION CATHODE PLATE AND METHOD FOR FABRICATING THE SAME
- 专利标题(中): 场发射阴极板及其制造方法
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申请号: US12985814申请日: 2011-01-06
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公开(公告)号: US20110101847A1公开(公告)日: 2011-05-05
- 发明人: Hung-Yuan LI , Jian-Min Jeng , Ching-Hsuang Cheng , Nien-Chun Chin , Tzung-Han Yang
- 申请人: Hung-Yuan LI , Jian-Min Jeng , Ching-Hsuang Cheng , Nien-Chun Chin , Tzung-Han Yang
- 申请人地址: TW Taipei TW Hsinchu
- 专利权人: Tatung Company,Industrial Technology Research Institute
- 当前专利权人: Tatung Company,Industrial Technology Research Institute
- 当前专利权人地址: TW Taipei TW Hsinchu
- 优先权: TW097144249 20081114
- 主分类号: H01J1/14
- IPC分类号: H01J1/14 ; H01J9/04
摘要:
A field emission cathode plate is disclosed, which includes: a substrate; a cathode layer, disposed on the substrate; a conductive layer with an arc surface or a resistor layer with an opening and resistivity larger than that of the cathode layer, disposed on the cathode layer; and a cambered field emission layer, having an arc surface and disposed on the conductive layer or on the cathode layer in the opening of the resistor layer and covering the resistor layer around the opening. The present invention also provides a method for fabricating the above-mentioned field emission cathode plate. The method can provide field emission cathode plate achieving uniform field emission and does not involve high resolution and cost.
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