发明申请
US20110111339A1 BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF
有权
双层系统，其中包括基于聚二甲基硅氧烷的底层及其组合物
- 专利标题： BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF
- 专利标题（中）： 双层系统，其中包括基于聚二甲基硅氧烷的底层及其组合物
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申请号： US12613800申请日： 2009-11-06
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公开(公告)号： US20110111339A1公开(公告)日： 2011-05-12
- 发明人: Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
- 申请人： Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito , Hoa D. Truong
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.