An electron beam lithography apparatus includes a beam current detector which detects, during drawing of the drawing data, fluctuation of an irradiation position of the electron beam at non-irradiation on the substrate; a beam position error detector which detects a beam position error of the electron beam based on the fluctuation of the irradiation position; a drive position error detector which detects a drive position error of the stage due to rotation and translation drive during drawing of the drawing data; and a corrector which corrects the irradiation position of the electron beam during the drawing based on the beam position error and the drive position error.