发明申请
US20110114984A1 SUPPORTING SUBSTRATE FOR MANUFACTURING VERTICALLY-STRUCTURED SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE USING THE SUPPORTING SUBSTRATE 有权
用于制造垂直结构的半导体发光器件的支撑衬底和使用支撑衬底的半导体发光器件

  • 专利标题: SUPPORTING SUBSTRATE FOR MANUFACTURING VERTICALLY-STRUCTURED SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE USING THE SUPPORTING SUBSTRATE
  • 专利标题(中): 用于制造垂直结构的半导体发光器件的支撑衬底和使用支撑衬底的半导体发光器件
  • 申请号: US13054472
    申请日: 2009-07-15
  • 公开(公告)号: US20110114984A1
    公开(公告)日: 2011-05-19
  • 发明人: Tae Yeon Seong
  • 申请人: Tae Yeon Seong
  • 优先权: KR10-2008-0068536 20080715
  • 国际申请: PCT/KR09/03905 WO 20090715
  • 主分类号: H01L33/10
  • IPC分类号: H01L33/10 H01L29/30 H01L33/62
SUPPORTING SUBSTRATE FOR MANUFACTURING VERTICALLY-STRUCTURED SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING DEVICE USING THE SUPPORTING SUBSTRATE
摘要:
The present invention is related to a supporting substrate for manufacturing vertically-structured semiconductor light emitting device and a vertically-structured semiconductor light emitting device using the same, which minimize damage and breaking of a multi-layered light-emitting structure thin film separated from a sapphire substrate during the manufacturing process, thereby improving the whole performance of the semiconductor light emitting device.The supporting substrate for manufacturing the vertically-structured semiconductor light emitting device of the present invention comprises: a selected supporting substrate formed of a material having a difference of thermal expansion coefficient of 5 ppm or less from a sapphire substrate on which a multi-layered light-emitting structure thin film comprising a Group III-V nitride-based semiconductor is laminated; a sacrificial layer formed on the selected supporting substrate; a thick metal film formed on an upper part of the sacrificial layer; and a bonding layer formed on an upper part of the thick metal layer and formed of a soldering or brazing alloy material.
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