Invention Application
- Patent Title: GASIFICATION QUENCH CHAMBER DIP TUBE
- Patent Title (中): 气体瓶盖DIP管
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Application No.: US12957276Application Date: 2010-11-30
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Publication No.: US20110120009A1Publication Date: 2011-05-26
- Inventor: Helge Burghard Herwig Klockow , Prashant Tiwari
- Applicant: Helge Burghard Herwig Klockow , Prashant Tiwari
- Applicant Address: US NY Schenectady
- Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee Address: US NY Schenectady
- Main IPC: C10J3/72
- IPC: C10J3/72

Abstract:
A gasification quench chamber dip tube component is disclosed. The dip tube includes an elongate hollow element that has a first intake end and a second discharge end that is located distally opposite the intake end. The second discharge end includes either a plurality of elongate openings that are displaced circumferentially around the hollow element or a plurality of elongate elements displaced circumferentially around the hollow element thereby defining a plurality of elongate spaces therebetween that extend axially from the second discharge end. A quench chamber that employs the dip tube is also disclosed.
Public/Granted literature
- US09109173B2 Gasification quench chamber dip tube Public/Granted day:2015-08-18
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