发明申请
US20110121233A1 COMPOSITION FOR FORMING SUBSTRATE, AND PREPREG AND SUBSTRATE USING THE SAME
有权
用于形成基材的组合物，以及使用其的预浸料和底物
- 专利标题： COMPOSITION FOR FORMING SUBSTRATE, AND PREPREG AND SUBSTRATE USING THE SAME
- 专利标题（中）： 用于形成基材的组合物，以及使用其的预浸料和底物
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申请号： US12692439申请日： 2010-01-22
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公开(公告)号： US20110121233A1公开(公告)日： 2011-05-26
- 发明人: Geum Hee Yun , Jun Rok Oh , Keun Yong Lee
- 申请人： Geum Hee Yun , Jun Rok Oh , Keun Yong Lee
- 优先权： KR10-2009-0115370 20091126
- 主分类号： C09K19/34
- IPC分类号： C09K19/34 ; C08G69/26 ; C08G73/10
摘要：
Disclosed herein is a composition for forming a substrate, including: a compound prepared by polymerizing a liquid crystal thermosetting oligomer having one or more soluble structural units in a main chain thereof and having a thermosetting group at one or more of two ends of the main chain thereof with a fluorine compound having a functional group which can react with the main chain of the liquid crystal thermosetting oligomer.
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