发明申请
- 专利标题： MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT
- 专利标题（中）： 微观照明系统和微观照明光学单元
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申请号： US12974436申请日： 2010-12-21
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公开(公告)号： US20110122392A1公开(公告)日： 2011-05-26
- 发明人: Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
- 申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT GMBH
- 当前专利权人： CARL ZEISS SMT GMBH
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102008002749.9 20080627
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
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