发明申请
US20110122393A1 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
有权
基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
- 专利标题： Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
- 专利标题（中）： 基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
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申请号： US12929591申请日： 2011-02-02
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公开(公告)号： US20110122393A1公开(公告)日： 2011-05-26
- 发明人: Nobuyoshi Tanno , Takashi Horiuchi
- 申请人： Nobuyoshi Tanno , Takashi Horiuchi
- 申请人地址： JP Katta-gun JP Tokyo
- 专利权人： ZAO NIKON CO., LTD.,NIKON CORPORATION
- 当前专利权人： ZAO NIKON CO., LTD.,NIKON CORPORATION
- 当前专利权人地址： JP Katta-gun JP Tokyo
- 优先权： JP2003-349549 20031008; JP2003-349552 20031008
- 主分类号： G03B27/32
- IPC分类号： G03B27/32
摘要：
A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member.
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