发明申请
US20110133066A1 PATTERN INSPECTION DEVICE AND METHOD 审中-公开
图案检查装置及方法

  • 专利标题: PATTERN INSPECTION DEVICE AND METHOD
  • 专利标题(中): 图案检查装置及方法
  • 申请号: US13059540
    申请日: 2009-09-14
  • 公开(公告)号: US20110133066A1
    公开(公告)日: 2011-06-09
  • 发明人: Mari NozoeTaku Ninomiya
  • 申请人: Mari NozoeTaku Ninomiya
  • 优先权: JP2008-235847 20080916
  • 国际申请: PCT/JP2009/066464 WO 20090914
  • 主分类号: H01J37/26
  • IPC分类号: H01J37/26 G12B13/00 G01N23/22
PATTERN INSPECTION DEVICE AND METHOD
摘要:
An inspection apparatus and method are provided capable of suppressing electron beam focus drifts and irradiation-position deviations caused by sample surface charge-up by irradiation of an electron beam during micropattern inspection to thereby avoid false defect detection and also shorten an inspection time. The apparatus captures a plurality of images of alignment marks provided at dies, stores in a storage device deviations between the central coordinates of alignment mark images and the coordinates of the marks as a coordinate correction value, measures heights at a plurality of coordinates on the sample surface, captures images of the measured coordinates to perform focus adjustment, saves the relationship between such adjusted values and the sensor-measured heights in the storage as height correction values, and uses inspection conditions including the image coordinate correction values saved in the storage and the height correction values to correct the image coordinates and height of the sample.
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