发明申请
- 专利标题: ANALYTICAL METHOD AND ANALYTICAL SYSTEM
- 专利标题(中): 分析方法和分析系统
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申请号: US13057699申请日: 2009-07-22
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公开(公告)号: US20110133074A1公开(公告)日: 2011-06-09
- 发明人: Hideki Nakanishi , Keisuke Utani , Kohei Nishiguchi
- 申请人: Hideki Nakanishi , Keisuke Utani , Kohei Nishiguchi
- 专利权人: SUMITOMO SEIKA CHEMICALS CO., LTD.
- 当前专利权人: SUMITOMO SEIKA CHEMICALS CO., LTD.
- 优先权: JP2008-207786 20080812
- 国际申请: PCT/JP2009/063103 WO 20090722
- 主分类号: B01D59/44
- IPC分类号: B01D59/44 ; H01J49/10
摘要:
Analytical method and analytical system are presented, wherein properties of the carrier gas conveying fine particles and gas components generated by laser ablation can be prevented from inhibiting the optimization of analysis conditions, and plural kinds of elements can be stably measured with high sensitivity and good accuracy without losing operability, speed, and convenience when fine particles generated by laser ablation are plasma-analyzed. A sample α is converted into fine particles by a laser ablation device in the atmosphere of a first gas. The fine particles are conveyed from the laser ablation device to a gas replacement device by using the first gas as a carrier gas. The first gas of at least part of the carrier gas conveying the fine particles is replaced with a second gas by means of the gas replacement device. The fine particles are conveyed from the gas replacement device to the plasma analyzer by the carrier gas that has been subjected to the gas replacement. Constituent elements of the fine particles are analyzed by the plasma analyzer.
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