Invention Application
- Patent Title: POROUS NANOSTRUCTURE AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 多孔纳米结构及其制造方法
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Application No.: US12959501Application Date: 2010-12-03
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Publication No.: US20110133153A1Publication Date: 2011-06-09
- Inventor: Eun-kyung LEE , Dong-mok WHANG , Byoung-lyong CHOI , Sun-hwak WOO
- Applicant: Eun-kyung LEE , Dong-mok WHANG , Byoung-lyong CHOI , Sun-hwak WOO
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2009-0121410 20091208
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/02 ; B82Y99/00 ; B82Y40/00
Abstract:
Provided are a porous nanostructure and a method of manufacturing the same. The porous nanostructure includes a plurality of pores disposed on an exterior surface of a nanostructure, wherein at least a portion of the plurality of pores extend inside the nanostructure.
Public/Granted literature
- US09181091B2 Porous nanostructure and method of manufacturing the same Public/Granted day:2015-11-10
Information query
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